Photosensitive Polyesterimides Based on Reaction Development Patterning
نویسندگان
چکیده
منابع مشابه
Optical Patterning of Photosensitive Thin Film Silica Mesophases
Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporationinduced self-assembly process. UV-exposure promoted localized acid-catalyzed siloxane condensation, enabling selective etching of unexposed regions, thereby serving as a cresistIess’ technique to prepare patterned mesoporous silica. We also demo...
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ژورنال
عنوان ژورنال: Polymer Journal
سال: 2006
ISSN: 0032-3896,1349-0540
DOI: 10.1295/polymj.pj2006093